{"id":16543,"date":"2026-06-05T01:05:00","date_gmt":"2026-06-04T23:05:00","guid":{"rendered":"http:\/\/stocks-future.com\/?guid=20e9a27612c471766a078a4291b5df7d"},"modified":"2026-06-05T01:05:00","modified_gmt":"2026-06-04T23:05:00","slug":"atomera-breakthrough-targets-broader-rf-adoption-of-gan-on-silicon","status":"publish","type":"post","link":"https:\/\/stocks-future.com\/?p=16543","title":{"rendered":"Atomera Breakthrough Targets Broader RF Adoption of GaN-on-Silicon"},"content":{"rendered":"<p class=\"bwalignc\">\n<i>Novel approach addresses a critical performance barrier by reducing effects that limit high-frequency operation<\/i><\/p><p>LOS GATOS, Calif.--(BUSINESS WIRE)--Atomera Incorporated (NASDAQ: ATOM), a semiconductor materials and technology licensing company, today announced a new approach to GaN-on-Silicon that addresses a key performance barrier limiting its use in mainstream RF applications. Today, high-performance RF GaN devices are typically built on silicon carbide substrates, which provide excellent performance but remain costly and difficult to scale. Silicon offers a lower-cost, more scalable foundation with the potential to support larger wafer sizes and greater compatibility with standard silicon manufacturing; however, GaN-on-Silicon has historically underperformed in RF applications due to parasitic channel losses that reduce efficiency, especially at high frequencies. Atomera\u2019s MST<sup>\u00ae<\/sup> technology reduces these losses, helping close the performance gap, and offers exceptional linearity, enabling lower-cost GaN solutions for 5G, future 6G, and other high-frequency RF devices.<\/p><br\/><a href=\"https:\/\/mms.businesswire.com\/media\/20260604075701\/en\/2824727\/5\/Atomera_Logo_White_background.jpg\"><img src=\"https:\/\/mms.businesswire.com\/media\/20260604075701\/en\/2824727\/22\/Atomera_Logo_White_background.jpg\" \/><\/a><br\/><a href=\"https:\/\/mms.businesswire.com\/media\/20260604075701\/en\/2824727\/5\/Atomera_Logo_White_background.jpg\"><img src=\"https:\/\/mms.businesswire.com\/media\/20260604075701\/en\/2824727\/21\/Atomera_Logo_White_background.jpg\" \/><\/a><p>\n\u201cAtomera\u2019s latest GaN-on-Si devices show a substantial\u00a0reduction in parasitic interface charge, by more than an order of magnitude, and our RF characterization of the first MST-enabled samples confirms a significant reduction in RF losses,\u201d said Mostafa Emam, Founder &amp; CEO at Incize. \u201cBeyond the small-signal improvements, the large-signal results are particularly compelling. The best-performing MST samples exhibit outstanding linearity and power handling. This linearity benefit extends into the high-power regime, approaching performance levels typically associated with advanced RF SOI technologies.\u00a0For GaN-on-Si, these results represent a very exciting step forward.\u201d<\/p><p>\nAtomera\u2019s approach, MST, introduces a thin, oxygen-modified layer near the surface of the silicon wafer, creating a more favorable platform for GaN growth and making silicon a more viable foundation for high-performance RF devices. This controlled layer modifies the silicon lattice structure and helps block the diffusion of electrical dopants, improving crystal quality at the GaN\/silicon interface.<\/p><p>\n\u201cWe\u2019re fundamentally changing the economics of GaN. Atomera\u2019s MST is removing barriers to GaN-on-Silicon-based RF systems, unlocking breakthrough RF performance on low-cost silicon substrates,\u201d said Scott Bibaud, president and CEO of Atomera. \u201cSuccessfully overcoming challenges like the parasitic channel positions Atomera to achieve a competitive advantage in GaN-on-Silicon, which we believe will provide growth opportunities for Atomera in advanced RF and power electronics.\u201d\u00a0<\/p><p>\nIn Atomera\u2019s testing, MST enabled more than a 10x reduction in parasitic channel charge, reducing a key mechanism of RF power loss and supporting improved high-frequency GaN device performance. Furthermore, the test data has proven that MST will allow devices to handle significant power while maintaining signal quality, or linearity, under stress.<\/p><p>\n\u201cWe are delighted by the recent RF test data from Incize,\u201d said Robert Mears, Founder &amp; CTO of Atomera. \u201cLinearity is a top care-about for RF designers, and the new data shows MST GaN-on-Silicon achieving both the ultra-low RF losses and linearity metrics of advanced trap-rich RF SOI. At the benchmark input power of 30mW, the linearity is exceptional, 1000x better than the GaN-on-silicon reference wafer. The MST benefit extends all the way to 10W input power.\u201d<\/p><p>\nExplore our <a  href=\"https:\/\/cts.businesswire.com\/ct\/CT?id=smartlink&amp;url=https%3A%2F%2Fatomera.com%2Fmst-breakthrough-for-rf-gan-on-silicon-whitepaper%2F&amp;esheet=54547844&amp;newsitemid=20260604075701&amp;lan=en-US&amp;anchor=white+paper&amp;index=1&amp;md5=e7a421e528463b87313fbd8a511c0fdb\" rel=\"nofollow\" shape=\"rect\">white paper<\/a> to learn more.\u00a0<\/p><p>\n<b>About\u00a0Atomera<\/b><\/p><p>\nAtomera Incorporated\u00a0(NASDAQ: ATOM) is a semiconductor materials and technology licensing company focused on deploying its proprietary performance-enhancing technology into the semiconductor industry.\u00a0Atomera\u00a0has developed Mears Silicon Technology\u2122, or MST<sup>\u00ae<\/sup>, a quantum-engineered thin-film technology that increases performance and power efficiency in semiconductor transistors. MST can be implemented using equipment already deployed in semiconductor manufacturing facilities and is complementary to other nano-scaling technologies in the semiconductor industry roadmap. More information can be found at\u00a0<a  href=\"https:\/\/cts.businesswire.com\/ct\/CT?id=smartlink&amp;url=http%3A%2F%2Fwww.atomera.com&amp;esheet=54547844&amp;newsitemid=20260604075701&amp;lan=en-US&amp;anchor=www.atomera.com&amp;index=2&amp;md5=f730100afae652a893131401da1439af\" rel=\"nofollow\" shape=\"rect\"><b>www.atomera.com<\/b><\/a>.<\/p><br\/> <b>Contacts<\/b> <br\/><p>\n<b>Atomera Contact<\/b><br\/>Rachel Yang\n<br\/>The Hoffman Agency\n<br\/>t: (360) 910-5860\n<br\/><a  href=\"mailto:rachely@hoffman.com\" rel=\"nofollow\" shape=\"rect\">rachely@hoffman.com<\/a><\/p>","protected":false},"excerpt":{"rendered":"<p>Novel approach addresses a critical performance barrier by reducing effects that limit high-frequency operationLOS GATOS, Calif.&#8211;(BUSINESS WIRE)&#8211;Atomera Incorporated (NASDAQ: ATOM), a semiconductor materials and technology licensing company, today a&#8230;<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"class_list":["post-16543","post","type-post","status-publish","format-standard","hentry","category-infos-businesswire"],"_links":{"self":[{"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/posts\/16543","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/stocks-future.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=16543"}],"version-history":[{"count":1,"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/posts\/16543\/revisions"}],"predecessor-version":[{"id":16544,"href":"https:\/\/stocks-future.com\/index.php?rest_route=\/wp\/v2\/posts\/16543\/revisions\/16544"}],"wp:attachment":[{"href":"https:\/\/stocks-future.com\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=16543"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/stocks-future.com\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=16543"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/stocks-future.com\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=16543"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}